标准摘要
[中文适用范围]： IEC 63616:2025 规定了在微波和毫米波频率下对薄金属膜导电性能的测量方法。该方法旨在评估用于粘附在基板上的金属箔的导电性能，或形成在介质基板上的金属层的界面导电性能。该方法采用平衡型圆盘谐振器的高阶模式，并通过单个谐振器实现宽带导电性能测量。 [外文原描述]： IEC 63616:2025 relates to a conductivity measurement method of thin metal films at microwave and millimeter-wave frequencies. This method has been developed to evaluate the conductivity of a metal foil used for adhering to a substrate or the interfacial conductivity of a metal layer formed on a dielectric substrate. It uses higher-order modes of a balanced-type circular disk resonator and provides broadband conductivity measurements by using a single resonator.
英文名称Measurement of the conductivity for metal thin films at microwave and millimeter-wave frequencies - Balanced-type circular disk resonator method