标准摘要
[中文适用范围]： 本部分 IEC TS 62607 建立了一种标准化方法，用于通过电感耦合等离子体质谱法（ICP-MS）测定石墨烯基材料粉末的化学关键控制特性——金属杂质含量。金属杂质含量是通过 ICP-MS 质谱图测得元素的信号强度得出的。该方法适用于石墨烯及相关材料的粉末，包括双层石墨烯（2LG）、三层石墨烯（3LG）、少层石墨烯（FLG）、还原氧化石墨烯（rGO）和氧化石墨烯（GO）。典型应用领域是微电子行业，例如导电浆料、显示器等，用于指导材料设计，以及供下游用户选择合适产品。 [外文原描述]： IEC TS 62607-6-20:2022 (EN) IEC TS 62607 establishes a standardized method to determine the chemical key control characteristic - metallic impurity content for powders of graphene-based materials by - inductively coupled plasma mass spectrometry (ICP-MS). The metallic impurity content is derived by the signal intensity of measured elements through MS spectrum of ICP-MS. - The method is applicable for powder of graphene and related materials, including bilayer graphene (2LG), trilayer graphene (3LG), few-layer graphene (FLG), reduced graphene oxide (rGO) and graphene oxide (GO). – The typical application area is in the microelectronics industry, e.g. conductive pastes, displays, etc., for manufacturers to guide material design, and for downstream users to select suitable products.
英文名称Nanomanufacturing - Key control characteristics - Part 6-20: Graphene-based material - Metallic impurity content: Inductively coupled plasma mass spectrometry