标准摘要
[中文适用范围]: IEC TS 62607-6-28:2025是一项技术规范,确立了两种标准化方法,用于通过拉曼光谱测定石墨烯层数这一关键控制特性。本文件提供了两种互补的方法,用于确定石墨烯相关产品的层数:方法A,通过分析拉曼光谱中2D峰的线形;方法B,通过测量基底硅衬底的拉曼强度。这两种方法可以单独使用,但结合使用可以提高准确性并扩展对层数和堆叠配置的检测范围。 该方法适用于通过机械剥离法制备的石墨烯层,也可以谨慎地用于其他高质量石墨烯层,例如通过化学气相沉积法制备的石墨烯层。 该方法适用于在基底上具有AB和ABC堆叠结构的石墨烯层,其横向尺寸应至少为2微米。 方法A适用于最多4层的AB堆叠石墨烯,但随着层数增加,由于峰重叠问题,其可靠性会降低。 方法B可用于检测AB和ABC堆叠结构中的最多10层石墨烯,但要求使用氧化硅基底(SiO2在硅基底上)。 方法A和方法B的比较见附录A。 [外文原描述]: IEC TS 62607-6-28:2025, which is a Technical Specification, establishes two standardized methods to determine the key control characteristic • number of layers for graphene layers by • Raman spectroscopy. This document presents two complementary methods for determining the number of layers in graphene-related products: Method A, which analyzes the lineshape of the 2D-peak in the Raman spectrum, and Method B, which measures the Raman intensity from the underlying silicon substrate. The two methods can be employed individually but combining both methods enhances accuracy and extends the detection range for the number of layers and stacking configurations. - The method is intended to be used for graphene layers prepared by mechanical exfoliation, but also can be used with care for other high quality graphene layers, such as graphene layers prepared by chemical vapor deposition. - The method can be used for graphene layers with AB and ABC stacking on a substrate. Its lateral size should be at least 2 µm. - Method A is effective for AB stacked graphene up to 4 layers but becomes less reliable with more layers due to peak overlap. - Method B can detect up to 10 layers in AB and ABC stacking but oxidized silicon substrate (SiO2 on silicon substrate) is required. - The comparison of Method A and Method B can be found in Annex A.
英文名称Nanomanufacturing - Key control characteristics - Part 6-28: Graphene-related products - Number of layers for graphene films on a substrate: Raman spectroscopy