标准摘要
[中文适用范围]： 本国际标准规定了通过 XPS 对基材上的薄膜进行分析的报告中所需的最小信息量。 这些分析涉及均质薄膜的化学成分和厚度的测量，以及通过角度分辨 XPS、XPS 溅射深度分析、峰形分析和可变光子测量作为非均质薄膜深度的函数的化学成分能量XPS。 [外文原描述]： ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.
英文名称Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis