标准摘要
[中文适用范围]： 本国际标准规定了采用均匀掺杂材料测定单晶硅中硼原子浓度的二次离子质谱方法，该方法由经认证的硼注入参考材料校准。 该方法适用于浓度范围为1×1016原子/cm3至1×1020原子/cm3的均匀掺杂硼。 [外文原描述]： ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 10 16 atoms/cm 3 to 1 x 10 20 atoms/cm 3 .
英文名称Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials