标准摘要
[中文适用范围]： 本文件提供了全反射X射线荧光分析（TXRF）光谱仪的物理原理，并规定了仪器的要求。本文件规定了TXRF测量的校准、方法开发和验证的一般程序，以及质量控制。文件描述了在固定倾斜角（低于全反射临界角）且激发辐射强度显著增强的TXRF测量条件下进行的测量。尽管为澄清目的展示了某些掠射入射几何的定义，但本文件不适用于在这些条件下工作的测量装置。 [外文原描述]： The document provides the physical principles and specifies instrumental requirements for total reflection X‑ray fluorescence analysis (TXRF) spectrometers. This document specifies general procedures for calibration, method development and verification of TXRF measurements and quality control. The document describes measurements with TXRF conditions having a fixed glancing angle below the critical angle of total reflection and considerably enhanced excitation radiation intensity. Although certain definitions of grazing incidence geometry are shown for clarification, this document is not applicable to measurement setups working under such conditions.
英文名称Surface chemical analysis — Total reflection X-ray fluorescence — Principles and general requirements