涂覆和未涂覆金属试样的电化学阻抗频谱 (EIS). 第2部分: 数据收集

[中文适用范围]： 本部分 ISO 16773 提供了关于优化采集 EIS 数据的指南，重点是高阻抗系统。在涂层完好的情况下，高阻抗是指大于 10 Ω⋅cm 的系统。这并不排除对具有更低阻抗的系统的测量。有关未涂覆样品的额外信息，请参见 ISO/TR 16208。本部分处理以下内容：仪器设置的要求和注意事项；数据验证：检查测量范围和数据准确性；执行 EIS 测量：试样考虑因素和仪器参数；实验结果：不同方法呈现 EIS 数据。这些指南旨在确保获得可用于研究样品性能的 EIS 数据。本部分 ISO 16773 不提供数据解释的指南。 [外文原描述]： ISO 16773-2:2016 gives guidelines for optimizing the collection of EIS data with focus on high-impedance systems. High impedance in the context of intact coatings refers to systems with an impedance greater than 109 Ω⋅cm2. This does not preclude measurements on systems with lower impedance. For uncoated samples extra information can be found in ISO/TR 16208. ISO 16773-2:2016 deals with the following: - instrumental set-up: requirements and pit-falls; - data validation: checking the measurement range and the accuracy of the data; - performing an EIS measurement: specimen considerations and instrumental parameters; - the experimental results: different methods of presenting EIS data. These guidelines are intended to ensure the acquisition of EIS data that can be used to study the performance of the specimen. This part of ISO 16773 does not give guidelines for the interpretation of the data.