标准摘要
[中文适用范围]： 本国际标准规定了采用气相分解法或直接酸滴分解法从硅晶片工作标准材料表面收集铁和/或镍的化学方法。 本国际标准适用于铁和/或镍原子表面密度为 6 × 109 个原子/cm2 至 5 × 1011 个原子/cm2 的铁和/或镍。 [外文原描述]： ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.
英文名称Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy