标准摘要
[中文适用范围]： 本文件定义了原子层沉积前驱体的化学特性和相关工艺规范，包括纯度含量、金属纯度和阴离子含量规范。 [外文原描述]： This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.
英文名称Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors