表面化学分析 样品处理、制备和安装 第2部分：记录和报告分析用样品的制备和安装

[中文适用范围]： 本文件规定了分析人员在报告单、分析证书、报告或其他出版物中关于试样的接收、处理、制备、装样及其它表面分析相关信息应记录和报告的内容。适当的试样处理并具备充分文档是确保和评估分析可靠性和重复性的必要条件。此类信息除了其他与样品合成、加工历史和表征相关的信息外，还应成为数据记录的一部分（有时称为来源信息），包括材料来源以及自其起源以来发生的变化。本文件还包括总结重要制样和装样式过程及常见方法的规范性附录。试样处理程序记录和报告要求的描述遵循分析人员从接收样品到清洁或在分析室外进行样品制备、样品装样以及在分析室内进行处理的过程步骤。这些过程及其影响的描述旨在帮助分析人员理解对表面分析特殊试样处理条件和方法的记录要求，特别是对于使用包括Auger电子能谱（AES）、二次离子质谱（SIMS）和X射线光电子能谱（XPS）等技术的分析。所述方法也适用于其他对外表敏感的分析技术，如全反射X射线荧光光谱法（TXRF）、低能电子衍射（LEED）、某些类型的扫描探针显微镜（SPM），包括原子力显微镜（AFM）和扫描隧道显微镜（STM）、紫外光电子能谱（UPS）以及中低能离子散射（MEIS和LEIS[也称为离子表面散射，ISS）。本文件未指定分析仪器的性质、仪器条件（例如校准或真空质量）或操作程序的要求，以确保所述分析测量已适当进行。 [外文原描述]： This document specifies information to be reported by an analyst in a datasheet, certificate of analysis, report or other publication regarding the handling, preparation, processing and mounting of specimens for surface analysis. Appropriate sample handling with adequate documentation is needed to ensure and assess reliability and reproducibility of analyses. Such information is in addition to other details associated with specimen synthesis, processing history and characterization, and should become part of the data record (sometimes identified as provenance information) regarding the source of the material and changes that have taken place since it was originated. This document also includes normative annexes that summarize important processes and common approaches relevant to sample preparation and mounting for surface analysis. The descriptions of procedures for which records and reporting are required follow the steps that an analyst would follow from receiving the samples, to cleaning or processing outside of the analysis chamber, sample mounting and then treatments in the analysis chamber. The descriptions of the processes and their implications are intended as an aid for the analyst in understanding the reporting requirements for the specialized sample-handling conditions and approaches required for analyses by techniques such as Auger electron spectroscopy (AES), secondary-ion mass spectrometry (SIMS), and X-ray photoelectron spectroscopy (XPS). The methods described are also applicable for other analytical techniques, such as total reflection X-ray fluorescence spectroscopy (TXRF), low energy electron diffraction (LEED), some types of scanning probe microscopy (SPM) including atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), ultra-violet photoelectron spectroscopy (UPS) and medium- and low-energy ion scattering (MEIS and LEIS [also called ion surface scattering, ISS]) that are sensitive to surface composition. This document does not specify the nature of instrumentation, instrument conditions (e.g., calibration or vacuum quality), or operating procedures required to ensure that the analytical measurements described have been appropriately conducted.