标准摘要
[中文适用范围]： 本文件规定了半导体制造设备中陶瓷元件耐等离子性的测试方法。 它适用于半导体制造中使用的干法蚀刻室中的耐等离子元件的陶瓷元件。 [外文原描述]： This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
英文名称Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment