标准摘要
[中文适用范围]： 本文件规定了测量和报告特定有机材料的氩簇溅射产量的方法。 该方法需要一个或多个指定材料的测试样品，作为平坦基板上已知厚度在 50 至 1000 纳米之间的均匀薄膜，该基板具有与指定材料不同的化学成分。 本文件适用于指定材料层深度成分均匀的测试样品，如果指定材料中化合物的深度分布不均匀则不适用。 本文件适用于溅射离子束使用光栅照射样品以确保分析区域上离子剂量恒定的仪器。 [外文原描述]： This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.
英文名称Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials