碳基薄膜.用椭圆光谱法测定非晶碳薄膜的光学特性

[中文适用范围]： 本文件规定了用于测定 nk 平面内不同类型非晶碳薄膜的光学特性（折射率 n 和消光系数 k）和光学分类的光谱椭圆光度法。 它适用于电离蒸发、溅射、电弧沉积、等离子体辅助化学气相沉积、热丝技术等沉积的非晶碳薄膜。 它不适用于用金属或硅改性的碳膜、在厚度、油漆和清漆中具有成分/性能梯度的无定形碳膜。 [外文原描述]： This document specifies spectroscopic ellipsometry for the determination of optical properties (refractive index n and extinction coefficient k ) and the optical classification of different types of amorphous carbon films within the n - k plane. It is applicable to amorphous carbon films deposited by ionized evaporation, sputtering, arc deposition, plasma-assisted chemical vapour deposition, hot filament techniques and others. It does not apply to carbon films modified with metals or silicon, amorphous carbon films that have a gradient of composition/property in the thickness, paints and varnishes.