标准摘要
[中文适用范围]： 本标准规定了调制周期的基体条件和测试（包括低角X射线方法的原理、涂层的要求、X射线测量设备的要求、设备和样品的校准以及测试）通过低角度X射线方法（包括X射线反射率（XRR）和掠射X射线衍射（GIXRD））制备纳米多层涂层的条件和计算过程）。 [外文原描述]： This document specifies the substrate conditions and testing of the modulation period (including the principles for low-angle X-ray methods, the requirements of the coatings, the requirements for X-ray measuring apparatus, the calibration of apparatus and samples, and the testing conditions and calculation process) of nano-multilayer coatings by low-angle X-ray methods including X-ray reflectivity (XRR) and glancing incident X-ray diffraction (GIXRD).
英文名称Determination of modulation period of nano-multilayer coatings by low-angle X-ray methods