ISO 25164 ENT_PROGRESS

物理气相沉积涂层 TiAlSiN 薄膜的磁控溅射沉积 规范

标准摘要

This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.
英文名称Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification

替代关系

PDF下载提示

暂时无法下载

登录或查看会员