标准摘要
[中文适用范围]： 本文件规定了适用于透射电子显微镜 (TEM) 中在宽放大倍率范围内记录的图像的校准程序。用于校准的参考材料具有周期性结构，例如衍射光栅复制品、半导体的超晶格结构或用于 X 射线分析的分析晶体以及碳、金或硅的晶格图像。本文件适用于记录在摄影胶片或成像板上的 TEM 图像的放大，或由内置在数码相机中的图像传感器检测到的 TEM 图像的放大。本文件还涉及标尺的校准。本文件不适用于专用临界尺寸测量 TEM (CD-TEM) 和扫描透射电子显微镜 (STEM)。 [外文原描述]： This document specifies a calibration procedure applicable to images recorded over a wide magnification range in a transmission electron microscope (TEM). The reference materials used for calibration possess a periodic structure, such as a diffraction grating replica, a super-lattice structure of semiconductor or an analysing crystal for X-ray analysis, and a crystal lattice image of carbon, gold or silicon. This document is applicable to the magnification of the TEM image recorded on a photographic film, or an imaging plate, or detected by an image sensor built into a digital camera. This document also refers to the calibration of a scale bar. This document does not apply to the dedicated critical dimension measurement TEM (CD-TEM) and the scanning transmission electron microscope (STEM).
英文名称Microbeam analysis — Analytical electron microscopy — Methods for calibrating image magnification by using reference materials with periodic structures